XTPL

XTPL is developing a breakthrough technology for ultra-fine printing of a variety of nanomaterials.

XTPL is developing a breakthrough technology for ultra-fine printing of a variety of nanomaterials. The technology protected by a patent application is innovative on a global scale. XTPL technology allows the production of a line width of a single micron (1-5 micrometers), i. e. about 50 times narrower than the standard lines used for digital printing or screen printing. When printing metallic nanomaterials, the XTPL technology enables the production of ultra-thin (1 to 5 micrometers) electrically conductive lines. At the same time the minimum width of the manufactured conductive elements enables unprecedented optical transparency of the manufactured structures. The use of the above features of XTPL technology will allow the development of a new generation of TCF layers (Transparent Conductive Films). XTPL technology XTPL allows to obtain low-cost layers of very high optical transparency and a very low surface resistance. The developed technology is applicable in the global industries of thin film solar cells and in the manufacturing of LCDs.